AMAT 0041-75950 Cchemical Vapor Deposition Reactor REG670 Relative Humidity: 5% to 96%

Relative Humidity: 5% to 96% (non-condensing)

maintenance

suitable for harsh environments

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Gross Weight: 2 kg

AMAT 0041-75950 Cchemical Vapor Deposition Reactor REG670 Relative Humidity: 5% to 96%Description The AMAT 0041 75950 is a Chemical Vapor Deposition (CVD) reactor, designed as a temperature controlled heating or cooling reactor for thin film deposition. It is used to deposit conformal and uniform films on various substrates. The reactor consists of a reaction chamber enclosed in a vacuum sealed container, allowing precise thermal control and efficient material transfer. This equipment operates within a temperature range from room